Ultrafast Mirrors
Ultrafast mirrors have high laser-induced damage thresholds, greater reflectance, and low Group Delay Dispersion (GDD) effects on the ultrashort pulses. They are utilized in the beam steering applications with Ti:Sapphire, Yb:YAG, Yb:KGW and Er:Fiber laser fundamental wavelengths as well as their harmonics. Ultrafast laser mirrors are used in various fields including spectroscopy, material processing, and the medical industry.
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Products
Specifications
Diagrams
| Part Number | Wavelength (nm) | Dimension (mm) | Thickness (mm) | Material | Group Delay Dispersion |
|---|---|---|---|---|---|
| RFS-1-6.35-UM1 | 355 - 455 | 25.4 | 6.35 | Fused Silica | < 30 fs² |
| RFS-30-5-UM1 | 355 - 455 | 30.0 | 5.00 | Fused Silica | < 30 fs² |
| RFS-1.5-6.35-UM1 | 355 - 455 | 38.1 | 6.35 | Fused Silica | < 30 fs² |
| RFS-1.5-9.5-UM1 | 355 - 455 | 38.1 | 9.50 | Fused Silica | < 30 fs² |
| RFS-2-9.5-UM1 | 355 - 455 | 50.8 | 9.50 | Fused Silica | < 30 fs² |
| RFS-1-6.35-UM2 | 460 - 590 | 25.4 | 6.35 | Fused Silica | < 30 fs² |
| RFS-30-5-UM2 | 460 - 590 | 30.0 | 5.00 | Fused Silica | < 30 fs² |
| RFS-1.5-6.35-UM2 | 460 - 590 | 38.1 | 6.35 | Fused Silica | < 30 fs² |
| RFS-1.5-9.5-UM2 | 460 - 590 | 38.1 | 9.50 | Fused Silica | < 30 fs² |
| RFS-2-9.5-UM2 | 460 - 590 | 50.8 | 9.50 | Fused Silica | < 30 fs² |
| RFS-1-6.35-UM3 | 970 - 1150 | 25.4 | 6.35 | Fused Silica | < 30 fs² |
| RFS-30-5-UM3 | 970 - 1150 | 30.0 | 5.00 | Fused Silica | < 30 fs² |
| RFS-1.5-6.35-UM3 | 970 - 1150 | 38.1 | 6.35 | Fused Silica | < 30 fs² |
| RFS-1.5-9.5-UM3 | 970 - 1150 | 38.1 | 9.50 | Fused Silica | < 30 fs² |
| RFS-2-9.5-UM3 | 970 - 1150 | 50.8 | 9.50 | Fused Silica | < 30 fs² |
Material: Fused Silica
Dimension Tolerance: +0.0/-0.2mm
Thickness Tolerance: ±0.2mm
Surface Quality: 20/10 S-D
Clear Aperture: >80%
Reflectance: >99%
Angle of Incidence: 45°
Flatness: < λ/10 @ 632.8nm
Group Delay Dispersion: < 30fs² (for s & p-polarized light)
Coating: HR
Damage Threshold: >100mJ/cm² @ 800nm, 50fs, 50Hz
